Deposition

LocationPhysical Sciences Building Rm 440 DescriptionThe Trion Orion II is a compact, high-performance Plasma-Enhanced Chemical Vapor Deposition (PECVD) system designed for depositing high-quality dielectric thin films. Its unique reactor design offers precise process control for applications in microelectronics, photonics, and MEMS fabrication. This system uses TEOS as a silicon source and operates without a load…

LocationEngineering 1 Rm 163 Description Configuration/SpecificationsAccommodates four 2-inch sputtering targets.Equipped with a DC power supply featuring High Power Impulse Magnetron Sputtering (HiPIMS) capability.Includes two RF power supplies for precise plasma processing.Toxic materials are not permitted in this system. Substrate size4″ substrates MakeAJA International ModelCustom made RateCECS Tier-3

LocationEngineering 1 Rm 124 DescriptionThe Anric AT410 is a compact, tabletop Atomic Layer Deposition (ALD) system designed for precise, conformal thin-film deposition. It is particularly suited for research and development applications in microelectronics, nanotechnology, and materials science. The system accommodates substrates up to 4 inches (100 mm) in diameter and offers a user-friendly interface, making…

LocationPhysical Sciences Building Rm 440 DescriptionUsed for optical coatings and materials incompatible with electronic devices. Configuration/Specifications4 interchangeable pockets under vacuumMaximum Power: 3kWUltra-High Vacuum Turbo PumpRecommended crucible/liner: International Advanced Materials 3C-2-04 (2cc)Top Dia – 0.75″ Height – 0.375″ Wall – 0.09″ Substrate size4″ substrates Standard Operating Procedure MakeThermionics ModelTLG-6000 RateMPF Tier-3

LocationCREOL Rm 180 DescriptionThe Denton Desktop Pro is a high-vacuum magnetron sputtering system designed for research and development applications. It supports both DC and RF sputtering, enabling the deposition of a wide range of materials including metals, magnetic films, and dielectrics. Its confocal configuration with one or two cathodes ensures excellent film uniformity and process…

LocationEngineering 1 Rm 124 DescriptionThe AJA International ATC 1800 Sputtering System is a DC/RF PVD coating tool with a load lock. It is equipped with a turbo molecular pump (TMP) and circular magnetron sputtering sources featuring in-situ source head tilting for precise and repeatable con-focal, direct, and off-axis thin film deposition. The system offers substrate…

LocationCREOL Rm 180 DescriptionCustom eBeam by V&N Automation systems Configuration/SpecificationsLeybold turbo pumpTelemark Programmable Sweep ControllerRecommended crucible/liner: International Advanced Materials 8C-4-03 (4cc)Top Dia – 0.889″ Height – 0.59″ Wall – 0.093″ Substrate size4″ substrates Standard Operating Procedure MakeV&N Advanced Automation Systems Model400E RateCREOL Tier-2

LocationPhysical Sciences Building Rm 440 DescriptionCustom built Configuration/SpecificationsTilt-stage 90 degrees4 interchangeable pockets under vacuumO2 oxidation capabilitySweep FunctionalityUltra-High Vacuum CryopumpMaximum Power: 8kwRecommended crucible/liner: EVCEB-23 Graphite Crucible Liner1.125″ Top OD X 0.520″ High X 0.093″ Wall, 15 Deg Wall Angle, 7cc Pocket Vol, 3.7cc Liner Vol Substrate size4″ substrates Standard Operating Procedure MakeCustom built ModelCustom built RateMPF…

LocationEngineering 1 Rm 124 DescriptionThis custom-built system from AJA International closely matches the specifications of the ATC-2200E series, featuring a cylindrical UHV-style chamber. It is equipped with multi-pocket linear UHV electron beam evaporation sources, enabling high-purity thin film deposition. The system also includes a turbo molecular pump (TMP) and load-lock capability, ensuring excellent vacuum integrity…

LocationEngineering 1, Rm 124 DescriptionThe AJA ATC 2200-V is a versatile physical vapor deposition (PVD) system designed for a wide range of thin film applications. It features a load-locked chamber, turbo molecular pumping, and multiple circular magnetron sputtering sources with in-situ source head tilting. This allows for precise and repeatable confocal, direct, and off-axis thin…