Location
CREOL Rm 180
Description
The UniTemp RTP-150 is a compact, high-performance rapid thermal processing and vacuum annealing system designed for research and development applications in semiconductor and materials science cleanrooms. It uses a quartz chamber and 24 infrared lamps to provide fast, uniform heating and controlled cooling, ideal for processes such as annealing, alloying, densification, and post-implant thermal treatments. The integrated SIMATIC® controller with a touchscreen interface allows flexible program setup and data logging for precise process control.
Configuration/Specifications
Process chamber:
– Quartz glass with integrated gas inlet/outlet
Heating:
– Top and bottom infrared lamp heating (21 kW total).
– Maximum temperature: Up to ~1200 °C
Ramp rates:
– Ramp-up: T < 1000 °C: up to 75 K/s.
– Ramp-up: 1000 °C < T < 1200 °C: up to 50 K/s.
– Ramp-down: 1000 °C > T > 400 °C: 200 K/min.
– Ramp-down: 400 °C > T > 100 °C: 30 K/min.
Holding time:
– 1200 °C: 30 sec
– 1100 °C: 60 sec
– 1000 °C: 3 min
– Temperature uniformity: ≤ ±1.5 % of set temperature.
Control system:
– SIMATIC® controller with 7″ touchscreen; supports up to 50 programs with 50 steps each.
Vacuum capability:
– Process chamber can be evacuated down to a pressure of 10⁻3 hPa
Substrate size
up to 150mm diameter
Available gases
Forming gas (5% H2/N2), N2, O2
Make
UniTemp
Model
RTP-150