The CREOL Nanofabrication Facility (CNF) consists of 3,000 square feet of Class 100 and Class 1000 cleanrooms with standard optical lithography, deposition and etching tools, as well as a Raith 5000+ e-beam lithography instrument capable of 10-nm resolution. CNF is used for the fabrication of integrated photonic devices and circuits, as well as nanostructured materials and samples.