Location
MPF Rm 440
Description
The Laurell WS-650-23 is a precision spin coater designed for uniform thin film deposition on substrates up to 150 mm in diameter. Commonly used for photoresist, sol-gel, and other material coatings, it offers programmable spin profiles, variable acceleration, and a chemical-resistant chamber, making it ideal for research applications in photonics, MEMS, and microfabrication.
Configuration/Specifications
Speed Range: 0 to 12,000 RPM
Acceleration/Deceleration: Programmable in 1 RPM/s increments
Spin Time (Dwell): 0 to 5999.9 seconds per step, adjustable in 0.1-second increments
Program Storage: Up to 20 user-defined programs, each with up to 51 steps
Vacuum Chuck Compatibility: Supports substrates from 50 mm (2″) to 150 mm (6″) in diameter; includes adapters for fragments and microscope slides
Wafer alignment tools for precise substrate placement
Substrate size
Up to 150 mm (6″) round wafers or 127 mm × 127 mm (5″ × 5″) square substrates
Operations Manual
Make
Laurell
Model
WS-650-23
Rate
MPF Facility Use