Location
Physical Sciences Building, Rm 440
Description
The Samco RIE-1C is a compact, semi-automatic reactive ion etching (RIE) system used for precision etching of dielectric, semiconductor, and polymer materials. This system is widely used in microfabrication processes including photonics, MEMS, and thin film device applications.
Configuration/Specifications
Etch Type: Capacitively coupled parallel plate RIE
RF Power: 13.56 MHz, maximum 200 W
Substrate Cooling: Water-cooled electrode
Process Pressure Range: 10–500 mTorr
Process Gases: CF₄, O₂
Substrate size
4″ substrates
Standard Operating Procedure
Make
Samco
Model
RIE-1C
Rate
MPF Tier-2