Location
MPF Rm 440
Description
The OAI Model 200 Mask Aligner is a versatile photolithography tool designed for high-precision frontside alignment in microfabrication processes. Suitable for research and small-scale production, it offers reliable, repeatable exposure for MEMS, photonics, and microelectronic device fabrication.
Configuration/Specification
5x, 10x, and 2x objectives
Nominal 1 µm resolution
2 µm alignment accuracy
Proximity and contact mode
Substrate size
Up to 100 mm wafers or small pieces
Standard Operating Procedure
Make
Optical Associates Inc
Model
Hybralign Series 200
Rate
MPF Tier-2