Location
CREOL Rm 180
Description
The Temescal FC-2000 is an electron beam physical vapor deposition (EBPVD) system designed for high-purity thin film deposition in research and prototyping applications. It supports multi-material deposition with precise control over thickness and deposition rates, making it ideal for photonics, MEMS, and microelectronics device fabrication.
The system operates in a high-vacuum environment and uses a focused electron beam to vaporize source materials, which then condense onto substrates placed above the source pockets.
Configuration/Specifications
CTI-8 cryo pump
Dome sample rotation
Source Configuration: 4-pocket e-beam hearth
Independent pocket selection for sequential multi-material deposition
Film Thickness Monitoring: Quartz Crystal Microbalance (QCM) for in-situ rate and thickness control
Power Supply: 10 kW e-beam power
Recommended crucible/liner: EVCFABEB-13 Fabmate BG Crucible Liner
1.48″ Top OD X 0.67″ H X 0.125″ Wall, 15 Degree Wall Angle, 15cc Pocket Vol, 8.2 cc Liner Vol
Substrate size
4″ substrates
Make
Temescal
Model
FC-2000
Rate
CREOL Tier-2