CREOL PlasmaTherm PECVD

Location
CREOL Rm 180F

Description
PlasmaTherm Advanced Vacuum PECVD with silane and ammonia source gases capable of depositing high quality SiO_x and SiN_x films.

Configuration/Specifications
350C max
NH₃, SiH₄, SF₆, N₂O, Ar, N2

Substrate size
4″ wafers, pieces

Make
PlasmaTherm

Model
Vision 310 PECVD MKII

Rate
CREOL Tier-3