Location
CREOL Rm 180
Description
The GCA 8500 is a projection lithography system used for high-resolution patterning of photoresist on semiconductor wafers. It offers precise alignment and exposure control for the fabrication of micro- and nano-scale devices in research and prototyping environments.
Configuration/Specifications
Tropel 2235i 5:1 i-Line Reduction Lens
0.85 μm resolution in 1.0 μm of resist for production
0.75 μm resolution R&D
Field size = 15.5 mm square, 22 mm circular
Depth of focus = 1.5 μm
Numerical Aperture = 0.35
Dose control down to 30 mJ/cm2
Custom digital filter to deliver ultra-low dose energy and uniformity – 5 mJ/cm2 with 1.5% uniformity.
Model 6660 Series Environmental Chamber
Chuck for 100 mm shaped substrates and three (3) spacers that will accommodate thicknesses ranging from 400 μm to 1000 μm
5” quartz mask
Substrate size
4″ substrates
Make
GCA
Model
8500
Rate
CREOL Tier-3