Location
CREOL Rm 180
Description
The GCA 8500 is a projection lithography system used for high-resolution patterning of photoresist on semiconductor wafers. It offers precise alignment and exposure control for the fabrication of micro- and nano-scale devices in research and prototyping environments.
Configuration/Specifications
Tropel 2235i 5:1 I-Line Reduction Lens
0.85μm resolution in 1.0μm of resist for production
0.75μm resolution R&D
Field size = 15.5mm square, 22mm circular
Depth of focus = 1.49μm
Numerical Aperture = 0.35
Dose control down to 30mJ/cm2
Custom digital filter to deliver ultra-low dose energy and uniformity – 5mJ/cm2 with 1.5% uniformity.
Model 6660 Series Environmental Chamber
Chuck for 100mm shaped substrates and three (3) spacers that will accommodate thicknesses ranging from 400μm to 1000μm
Substrate size
6″ substrates
5” masks
Make
GCA
Model
8500
Rate
CREOL Tier-3