Location
CREOL Rm 180
Description
The Raith EBPG 5200 Plus is a high-performance electron beam lithography system designed for advanced nanofabrication applications. Operating at acceleration voltages of 50 kV and 100 kV, it achieves ultra-high-resolution patterning with feature sizes below 5 nm and overlay accuracy better than 5 nm.
Configuration/Specifications
50, 100 kV
125 MHz pattern generator
200, 300, 400 um apertures
Beam current up to 350 nA
Advanced alignment microscope
Active magnetic field cancellation system
Substrate size
5” masks, 3” wafers, pieces
Pre-requisites
Standard Operating Procedure
Make
Raith
Model
EBPG 5200+
Rate
Internal:
$180 1st hour minimum
$3 per minute thereafter
Monthly cap $6000
External Academic:
$270 1st hour minimum
$4.50 per minute thereafter
Industrial:
$720 1st hour minimum
$12 per minute thereafter
* charges are based on job run time. 1st hour includes loading/unloading, sample mounting, alignment, and job setup.