Location
Engineering 1 Rm 124
Description
The Anric AT410 is a compact, tabletop Atomic Layer Deposition (ALD) system designed for precise, conformal thin-film deposition. It is particularly suited for research and development applications in microelectronics, nanotechnology, and materials science. The system accommodates substrates up to 4 inches (100 mm) in diameter and offers a user-friendly interface, making it ideal for academic cleanroom environments.
Configuration/Specifications
Chamber Temperature Range: Room Temperature (RT) to 320 °C ± 1 °C
Process Pressure Control: 0.1 to 1.5 Torr
Three organometallic precursors up to 180 °C
Substrate size
4″ substrates
Operations Manual
Make
Anric
Model
AT410
Rate
CECS Tier-3