Location
Engineering 1 Rm 163
Description
Configuration/Specifications
Accommodates four 2-inch sputtering targets.
Equipped with a DC power supply featuring High Power Impulse Magnetron Sputtering (HiPIMS) capability.
Includes two RF power supplies for precise plasma processing.
Toxic materials are not permitted in this system.
Substrate size
4″ substrates
Make
AJA International
Model
Custom made
Rate
CECS Tier-3