Location
Engineering 1 Rm 124
Description
The AJA International ATC 1800 Sputtering System is a DC/RF PVD coating tool with a load lock. It is equipped with a turbo molecular pump (TMP) and circular magnetron sputtering sources featuring in-situ source head tilting for precise and repeatable con-focal, direct, and off-axis thin film deposition. The system offers substrate heating capability, adaptive pressure control, and includes a heavy-duty hoist for lifting the chamber top, providing convenient system access for maintenance and configuration.
Configuration/Specifications
Three 3-inch sputtering targets.
Equipped with one DC power supply (maximum output 500 W) and two RF power supplies (up to 500 W at 13.56 MHz) for precise, controlled plasma processing.
Available process gases: Argon (Ar), Oxygen (O₂), Argon/Hydrogen (Ar/H₂), and Nitrogen (N₂).
Toxic materials are not permitted in this system.
Substrate size
4″ substrates
Standard Operating Procedure
Make
AJA International
Model
ATC 1800
Rate
CECS Tier-3